专利名称：Method of manufacturing a display device
comprising a step of simultaneouslypolishing a second substrate and asemiconductor chip to have the samethickness as each other
发明人：Masumitsu Ino申请号：US13588620申请日：20120817公开号：US08804089B2公开日：20140812
专利附图：
摘要：A display device including: a first substrate with a pixel switch and driversmounted thereon; a second substrate disposed in facing relation to the first substrate; amaterial layer held between the first substrate and the second substrate and havingperipheral edges sealed by a seal member, the material layer having an electroopticaleffect; and a semiconductor chip mounted as a COG component on the first substrate,the semiconductor chip having a control system configured to control the drivers;wherein the semiconductor chip having a thickness equal to the total thickness of theseal member and the second substrate or larger than the thickness of the seal memberand smaller than the total thickness.
申请人：Masumitsu Ino
地址：Kanagawa JP
国籍：JP
代理机构：Dentons US LLP
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