METHOD OF CLEANING PIPE OF IMMERSION EXPOSURE APPA

专利名称：METHOD OF CLEANING PIPE OF

IMMERSION EXPOSURE APPARATUS, ANDMETHOD OF MANUFACTURING DEVICE

发明人：Masayuki TANABE,Keiko CHIBA,Tatsuya

HAYASHI

申请号：US13439015申请日：20120404

公开号：US20120257180A1公开日：20121011

专利附图：

摘要：A method of cleaning a supply pipe of an immersion exposure apparatus

includes a cycle including a step of increasing a flow rate of a cleaning liquid via a supplypipe, which supplies a liquid to a gap between a substrate and a final surface of aprojection optical system, and a step of decreasing the flow rate, wherein the cycle isexecuted a plurality of times after one of completion of one of setting and maintenanceof the immersion exposure apparatus and completion of exposure of at least onesubstrate, and before exposure of a first shot region on a new substrate using theimmersion exposure apparatus.

申请人：Masayuki TANABE,Keiko CHIBA,Tatsuya HAYASHI

地址：Utsunomiya-shi JP,Utsunomiya-shi JP,Utsunomiya-shi JP

国籍：JP,JP,JP

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